Baoji City Changsheng Titanium Co.,Ltd

Baoji City Changsheng Titanium Co., Ltd

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High Purity Sputtering Targets For Thin Film Deposition With Precise Control

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Baoji City Changsheng Titanium Co.,Ltd
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Country/Region:china
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High Purity Sputtering Targets For Thin Film Deposition With Precise Control

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Target Configuration :Single Or Multiple
Technique :Forged And CNC Machined
Coating Method :Sputtering
Forming Process :Hot Isostatic Pressing(HIP)
Thickness :10-600mm
Surface Finish :Polished
Purity :99.99%
Density :Customized
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Product Description:

Our Metal Sputtering Target is bonded with Indium, a highly effective material for ensuring a secure and reliable bonding between the target and the backing plate. This ensures that the target stays in place during the sputtering process, resulting in a high-quality output.

The Metal Sputtering Target is made with 99.99% purity, ensuring that it is free from impurities that may affect the quality of the output. This makes it a perfect choice for applications that require a high level of precision, such as the production of electronic devices and semiconductor components.

Our Metal Sputtering Target is versatile and can be used for a wide range of applications. It is especially useful for industries that require a high level of accuracy and consistency, such as the production of Freefall Metal Detector machines and Hot Melt Glue Guns.

Choose our Metal Sputtering Target for your next project and experience the benefits of a high-quality material that is designed to cater to your specific needs. Contact us today to learn more about our customized options and how we can help you achieve your production goals.


Features:

  • Product Name: Metal Sputtering Target
  • Surface: Polished, Anodizing
  • Coating Method: Sputtering
  • Target Bonding: Indium
  • Technique: Forged And CNC Machined
  • Crystal Structure: Customized
  • Industrial Metal Detector Conveyor: Compatible
  • Alloy Steel Metal: Compatible
  • 3D Printing Metal Powder: Compatible

Technical Parameters:

Technical Parameter Description
Surface Polished, Anodizing
Thickness 10-600mm
Crystal Structure Customized
Substrate Compatibility Customized
Surface Roughness Ra < 0.8 Um
Target Bonding Indium
Surface Finish Polished
Technique Forged And CNC Machined
Forming Process Hot Isostatic Pressing(HIP)
Density Customized

Applications:

The density of the metal sputtering target is customizable according to different production needs. The target bonding is done using Indium, which is a reliable material for bonding the target to the backing plate. The thickness of the target can range from 10-600mm, which makes it versatile for various coating applications. The substrate compatibility of the target can also be customized according to different needs.

The metal sputtering target is suitable for use in a hot melt glue gun. The target can be used to coat the glue gun nozzle and other components, which helps to improve its wear resistance. In addition, the target can be used to produce a thin film on the surface of the glue gun, which enhances its anti-corrosion properties and extends its service life.

The metal sputtering target is also suitable for use in a conveyor metal detector machine. The machine is widely used in the food industry to detect metal contamination in food products. The metal sputtering target can be used to coat the metal detector components, which helps to improve their sensitivity and accuracy.

The metal sputtering target can also be used in other fields, such as the production of magnetic storage media, optical storage media, and decorative coatings. The sputtering method is a highly efficient and environmentally friendly coating process, which makes it a popular choice in various industries.


Customization:

Product Customization Services:

  • Surface Finish: Polished
  • Forming Process: Hot Isostatic Pressing(HIP)
  • Coating Method: Sputtering
  • Material: Metal
  • Target Bonding: Indium

Our Metal Sputtering Target product can also be customized with additional options, including:

  • 3D Printing Metal Powder
  • Carbon Steel I Beam
  • Carbon Steel I Beam

Support and Services:

Our Metal Sputtering Target product is designed to meet the needs of a variety of applications, including semiconductor and thin film deposition technologies. Our team of technical support professionals is available to provide assistance in selecting the right target material for your specific application, as well as to answer any questions you may have about target performance and compatibility with your deposition system.

In addition to our technical support services, we also offer a range of value-added services to ensure that your Metal Sputtering Target product delivers optimal performance and longevity. These services include custom target design and fabrication, target bonding, target recycling, and target analysis and testing.

Our commitment to quality and customer satisfaction extends to our after-sales support services as well. Our technical support team is available to provide troubleshooting assistance and to resolve any issues that may arise with your Metal Sputtering Target product.








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