Baoji City Changsheng Titanium Co.,Ltd
Baoji City Changsheng Titanium Co., Ltd
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The crystal structure of the Metal Sputtering Target can be customized to meet the unique requirements of each application. The target is polished to ensure a smooth surface, which is essential for achieving optimal results. The surface can also be anodized for enhanced durability and resistance to wear and tear.
The purity of the Metal Sputtering Target is 99.99%, which ensures that it delivers consistent performance over time. This high level of purity is achieved through a rigorous manufacturing process that involves the use of advanced technologies and techniques.
The Metal Sputtering Target is bonded with indium, which provides a strong and reliable connection to the substrate. This bonding process is critical for ensuring that the target is firmly secured in place during the sputtering process.
The Metal Sputtering Target is compatible with a variety of sputtering systems, including those that use an electrostatic powder coating gun, carbon steel I beam, or hot melt glue gun. This compatibility makes it a versatile product that can be used in a wide range of industrial and scientific applications.
Overall, the Metal Sputtering Target is a high-quality product that delivers reliable and consistent performance. Its customizable crystal structure, polished surface, and high purity make it an ideal choice for a wide range of applications, while its strong bonding with indium ensures that it remains firmly in place during the sputtering process.
This Metal Sputtering Target product is ideal for industries that require high purity metals for their processes. The surface roughness is carefully controlled to ensure that Ra < 0.8 Um. The target configuration can be either single or multiple targets, depending on your requirements. The surface can be polished or anodized, depending on your preference. The surface finish is always polished to ensure that the sputtering process is consistent. The purity of the metal is 99.99%, ensuring that your processes are not contaminated with impurities. This product is a key component in 3D Printing Metal Powder, Carbon Steel I Beam, and Hot Melt Glue Gun manufacturing processes.
| Density | Customized |
| Target Bonding | Indium |
| Coating Method | Sputtering |
| Substrate Compatibility | Customized |
| Technique | Forged And CNC Machined |
| Surface | Polished, Anodizing |
| Material | Metal |
| Shape | Round |
| Surface Finish | Polished |
| Forming Process | Hot Isostatic Pressing(HIP) |
One of the primary applications of Metal Sputtering Target is in the manufacturing of semiconductors. It is commonly used as a deposition material for thin film coatings on silicon wafers. The Metal Sputtering Target is also used in the production of solar cells, LED displays, and other electronic components. Additionally, this material is ideal for use in the production of magnetic storage media, such as hard disk drives.
Another application of Metal Sputtering Target is in the production of decorative coatings. The material is used in the electrostatic powder coating gun to create a smooth and even coating on various surfaces, including metal, plastic, and glass. The Metal Sputtering Target is also used in the manufacturing of high-performance alloy steel metal, which is commonly used in the aerospace and automotive industries.
Furthermore, the Metal Sputtering Target is widely used in the production of medical devices and equipment. The material is used in the manufacturing of pacemakers, hearing aids, and other medical implants. It is also used in the production of medical instruments and tools.
The Metal Sputtering Target is compatible with a wide range of manufacturing processes, including hot isostatic pressing (HIP) and various machining processes. It is also ideal for use in applications that require high precision and accuracy. The material can be configured as a single or multiple target, depending on the specific application requirements.
The Metal Sputtering Target is also suitable for use in the conveyor metal detector machine. It is highly resistant to corrosion and wear, making it an ideal choice for use in harsh environments. The material is also easy to clean and maintain, making it a cost-effective solution for various applications.
Customize your Metal Sputtering Target with our Product Customization Services. Choose from the following attributes:
Our Metal Sputtering Target is made with high-quality Carbon Steel I Beam and is compatible with our Freefall Metal Detector technology. Additionally, we offer 3D Printing Metal Powder for your customization needs.
Our Metal Sputtering Target products are designed to meet the demanding requirements of thin film deposition in the semiconductor, display, and solar industries. We offer a wide range of materials including pure metals, alloys, and ceramics in various shapes and sizes to fit your specific process needs.
Our technical support team is available to assist you with any questions you may have about our sputtering targets including material selection, target bonding, and process optimization. We also offer custom target design and fabrication services to meet your unique requirements.
In addition to our sputtering target products, we also offer a variety of services to support your thin film deposition processes. These include:
Our goal is to provide you with high-quality products and services to help you achieve your thin film deposition goals. Contact us today to learn more about our Metal Sputtering Target products and services.